Study on photoelectricity properties of SiCN thin films prepared by magnetron sputtering
نویسندگان
چکیده
SiCN thin film is one of the most attractive silicon-based materials due to its excellent electrical, mechanical and optical properties. In this study, films have been prepared by radio frequency reactive magnetron sputtering method under different power, pressure, substrate temperature. The microstructure, morphology, field emission properties were performed. results indicated that high-quality successfully it proved these can be tailored preparation conditions. A main near ultraviolet light line at around 370 nm in makes suitable for development optoelectronic devices. This study provide novel guidance controlled sputtering.
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ژورنال
عنوان ژورنال: Journal of materials research and technology
سال: 2021
ISSN: ['2238-7854', '2214-0697']
DOI: https://doi.org/10.1016/j.jmrt.2021.08.043